Equipment
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Equipment
  • Main function of this machine including high voltage ion bombard, coat aluminum film and hard SiOx protective film at one time inside the vacuum chamber. Hard SiO protective film imporves the capability of anti- nitriding and keeps the high reflective rat
  • This series of machine has combined rectange plane cathod arc ion coating technique,DC magnetron sputtering technique,MF magnetron sputtering technique and pulsed bias technique on one machine at the same time.This model has become the mainstream of metal
  • Used in food, medical, cigarette packets, nonwovens, paper etc packaging materials , no plating empty lines, endless lines, wrinkles, and aluminum slag splashing, non-polluting, more uniform coating film, thermal deformation force of the film will be smal
  • Pioneered adopt rugged ultra-low temperature deposition technology (PVD decorative coating physical vapor deposition), use ultra-low temperature deposition equipment plating a full range of high performance products, in line with industry standards, with
  • This machine can achieve a good reproducibility and stable manufacture of high quality optical wavelength film, including the decorative film comprises a functional film , nitride film, applied in LED, optical oscilloscope, electronic components, digital
  • Computer automatic control, interface design simple operation, high reproducibility coating, equip with crystal sensor thickness meter, automatic evaporation deposition system, input parameters, process control and data storage capabilities, strengthen pr
  • This production line uses RF ion CVD technology. It has fast deposition rate, good film quality features. It can coat large size plain oxide film, nitride film, oxynitride film, a silicon film and amorphous silicon carbide film.
  • This production line for capacitive touch screen. It designed with 15 vacuum chamber. It includes one inlet chamber, one outlet chamber, one inlet buffer chamber,one outlet buffer chamber, one inlet transfer chamber, one outlet transfer chamber and two tr
  • It's designed with 15 vacuum chamber. It includes one inlet chamber, one outlet chamber, one inlet buffer chamber,one outlet buffer chamber, one inlet transfer chamber, one outlet transfer chamber and two transfer chambers; seven sputtering chamber, each
  • This production line has seven vacuum chambers in total,2 pairs MF twins Si target which adopts PCU04 closed loop control. 10 pairs cylinder AZO target to achieve high-quality transparent conductor AZO film.