Metal jewelry vacuum coating machine integrate DC magnetron sputtering, MF sputtering and arc ion evaporation technology, combined with linear ionization source and pulse bias thin film coating deposition particles. Improve the performance of various films, can coat the alloy films, composite film, multilayer films on metal surfaces as well as non-metallic. After years of dedicated research and development by our engineers, through a unique cathodic arc ion and unbalanced magnetron systems, we have developed a computer automatic control system to make good density of the coating adhesion as well as complex, and solve the complexity of manual operation, inconsistent color film and other issues.
Metal jewelry vacuum coating machine features:
1, Magnetron sputtering theory is based on the principle of cathode glow discharge theory, expanding the cathode surface magnetic field close to the workpiece surface, to increase the rate of ionization of sputtered atoms. It retains the delicate of magnetron sputtering and increase the gloss.
2, The evaporation source of arc plasma is reliable.It's able to work in accordance with current 30A, optimize the cathode and the coating of magnetic structure.The coating and substrate interface produce atomic diffusion, plus the ion beam assisted deposition function.
Applied Industry: The equipment is widely used in IPG clocks, IPS watches and clocks, guns IP, mobile phone shell, hardware, sanitary ware, tools, anti-friction tools, dies and molds, etc.It can be prepared TiN, TiCN coating, nitrogen of TIALN, TiNbu, TiCrN, zirconium nitride, various types of diamond film (DLC).
| Chamber size | Ф800×H900mm | Ф1100×H1200mm | Ф1350×H1250mm | Ф1600×H1250mm | Ф1900×H1250mm |
| Coating type | Multifunctional metal film, composite film, transparent conductive film, increasing back-reflection film, electromagnetic shielding film, decorative film | ||||
| Power source | DC magnetron power, MF magnetron power supply, high pressure ion bombardment power | ||||
| Target type | DC magnetron target, MF twin target, plane target, cylindrical target | ||||
| Vacuum chamber structure | Vertical double door,vertical single door | ||||
| Vacuum system | Mechanical pump + Roots pump + diffusion pump +holding pump (or optional: molecular pumps, poly-cold systems) | ||||
| Inflation System | Mass flow controller (1-4 road) | ||||
| Ultimate vacuum | 6×10-4pa（empty loaded、clean room） | ||||
| Pumping time | Pump from atmosphere to 5*10-3,≦13 minutes | ||||
| Workpiece rotation mode | 6-axis / 8 axis / 7-axis rotation and revolution / frequency stepless | ||||
| Control mode | Manual+Semi-Automatic+Full automatic all in one mode, Touch screen + PLC | ||||
| Remark | We can design the dimension of the equipment according to customer’s special technique requirement. |
||||
The equipment is widely used in IPG clocks, IPS watches and clocks, guns IP, mobile phone shell, hardware, sanitary ware, tools, anti-friction tools, dies and molds, etc. It can be prepared TiN, TiCN coating, nitrogen of TiAlN, TiN, TiCrN, ZrN, various types of diamond film (DLC).
