HCVAC Vacuum Technology Co.,Ltd, has been designed and produced various of ultra-vacuum coating equipments for college teaching and scientific research and development, viewing at different components of film growth.
Evaporation vacuum coating system： Using resistance thermal evaporation coating mode or electron beam evaporation method and applied to the preparation of the conductive film, thin film semiconductor, optical thin film, organic film and scanning electron microscope (SEM); by controlling the evaporation source baffle switch can realize plating of multilayer film, metallic film, film and composite.
Magnetron sputtering coating system： The single target sputtering method, for the research and development of monolayer, dielectric film, compound film; by way of four target sputtering, for preparation of a variety of semiconductor, growth monolayer, multilayer, composite film, film dielectric and ferroelectric ceramics films.
Pulsed laser deposition (PLD) system： Using laser of objects bombardment. Then the bombardment out the substance was precipitated in the different substrate, precipitation or film, manufacture of ceramic oxide, nitride films, metal multilayer, and a variety of superlattices.
According to different scientific research and experimental requirements, and different substrate preparation films, the design of the corresponding configuration of the equipment.
Application of semiconductor, solar, microelectronics, light industry and universities, laboratories, research institutes and other scientific experiments.
