Multi-axis magnetic bearing system for hanging from the rotor during operation to ensure that the risk of pollution, while the vibration, noise and maintenance requirements to a minimum, the molecular pump to be fully connected with a variety of advanced controllers, which can be used for multi-kinds of applications and processes, reliability and excellent performance through the test of practice can achieve maximum process flexibility.
Features and Benefits:
Advanced rotor technology
• The maximum process flexibility
• No oil
• Low vibration
• Highly reliable
• Maintenance-free
Advanced controller design
• Automatic adjustment
• self-diagnostic function
• DC motor drive
• No battery operation
Compact design
• Small footprint
• Half Rack Controller
| Intake flange | ISO100，CF100 |
| Exit | KF25 |
| Pumping speed | |
| N2 | 300 ls-1 |
| H2 | 300 ls-1 |
| Compression ratio | |
| N2 | >108 |
| H2 | >2 x 104 |
| The limit pressure of heating (VG/ISO flange | 6.5 x 10-6 Pa (5 x 10-8 Torr) |
| The limit pressure of heating (ICF flange | 10-8 Pa (10-10 Torr) |
| The maximum allowable inlet pressure (air cooling | 0.066 Pa (5 x 10-4 Torr) |
| Maximum continuous discharge pressure (air cooling | 13 Pa (0.1 Torr) |
| nominal speed | 48000 rpm |
| starting time | 3 min |
| Maximum inlet flange temperature | 120 °C |
| input voltage | 100 to 120 (± 10%) V alternating current or |
| 200 to 240 (± 10%) V alternating current | |
| Startup of the power consumption | 0.55 kVA |
| Pump weight | 11 kg |
| weight of the controller | 7 kg |
Metal (Al), tungsten and dielectric (oxide) and plasma etching of polysilicon (chloride, fluoride, and bromide);
Electron cyclotron resonance (ECR) etching;
Film deposition CVD, PECVD, ECRCVD, MOCVD;
Sputtering;
Ion implantation source, beam line pumping end station;
MBE ；
Diffusion ；
Photo resist stripping ；
Crystal / crystal film growth；
Wafer inspection ；
Load-lock vacuum chamber；
Scientific instruments: surface analysis, mass spectrometry, electron microscopy；
High energy physics: beam line, accelerator ；
Radiation applications: fusion systems, cyclotron
