The dual cathode system is designed to improve the accuracy by using the variable waveform.
• Alternating pulse characteristics
• Power range 5 kW~30KW
• Advanced arc management
• Through the flexible pulse parameter setting, the process optimized
• Advanced arc control to realize defect free film
• Pulse frequency up to 2*50kHz (positive and negative half circle)
Features：
• 8 power modes: from pure DC to bipolar pulse DC, the output voltage waveform
• Independent adjustment of positive and negative pulse duty cycle
• The whole pulse range is precisely treated with arc
• Frequency, pulse parameters can be adjusted
• Advanced arc method
Customer benifit：
• All stages of the process are flexible and variable
• Power output control, maximize the utilization ratio of target
• Reducing the residual arc energy and improving the quality of magnetron sputtering
• Optimization process, easy to operate
• One device with various applications
The whole pulse range is precisely treated with arc
| Product | Power supply | Output | Output | Cooling method | Power |
| [kW] | Voltage | Current | [V] | ||
| [V] | [A] | ||||
| TruPlasma Bipolar 4005 series | 5 | 800 | 12,5 | Air cooling | (±10%) 400 |
| TruPlasma Bipolar 4010 series | 10 | 800 | 25 | Air cooling | (±10%) 400 |
| TruPlasma Bipolar 4020 series | 20 | 800 | 50 | Air cooling | (±10%) 400 |
| TruPlasma Bipolar 4030 series | 30 | 800 | 75 | Air cooling | (±10%) 400 |
