Trulasma Bias 3000 Bias power supply series is for magnetron sputtering plating process using more power, two work modes: for substrate etching process of 1200 v high voltage mode, as well as for bias film deposition process of 300 V low voltage mode support.
• Fast arc management system
• Advanced monitoring and control system to ensure high stability and good reproducibility
TruPlasma Bias 4000 Bias power series can optimize your pulse DC plasma technology. The device can be divided into two modes: 1200 V high pressure mode for substrate etching process, and 300 V low pressure mode for supporting the bias layer deposition process.
• Fast arc management system
• Advanced monitoring and control system to ensure high stability and good reproducibility
Features:
• Unique performance and control design, and high stability
• Two seperated voltage modules
• Residual arc energy is the lowest level of similar products
• Self induction compensation for output cable
• Rear interface
Customer benifit:
• Production process stability
• One device with various applications
• High processing stability and good film quality
• Residual energy of neutral cable
• Best device connection settings
Product | Power supply | Output Voltage | Output Current | Cooling method | Power |
[kW] | High/low Pressure Mode | High/low Pressure Mode | [V] | ||
Mode | Mode | ||||
[V] | [A] | ||||
TruPlasma Bias 3003 | 3 | 1200 / 300 | 2,5 / 10 | Air cooling | (±10%) 400 |
TruPlasma Bias 3012 | 12 | 1200 / 300 | 10 / 40 | Air cooling | (±10%) 400 |
TruPlasma Bias 3018 | 18 | 1200 / 300 | 15 / 60 | Air cooling | (±10%) 400 |
TruPlasma Bias 3026 | 26 | 1200 / 300 | 22 / 87 | Air cooling | (±10%) 400 |
TruPlasma Bias 4012 | 12 | 1200 / 300 | 10 / 40 | Air cooling | (±10%) 400 |
TruPlasma Bias 4018 | 18 | 1200 / 300 | 15 / 60 | Air cooling | (±10%) 400 |
TruPlasma Bias 4026 | 26 | 1200 / 300 | 22 / 87 | Air cooling | (±10%) 400 |