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TruPlasma MF 3000 power supply—The highest level of plasma excitation

• Particularly compact structure
• Suitable for medium and small power supply
• Power ranges from 10 kW to 40 kW
• Been recognized by dual magnetron sputtering process market

Features：
• Fast arc management system, sine wave output waveform
• Wide range of output power
• Leading power technology

Customer benifit：
• Can achieve high-speed deposition rate
• Meet different process applications
• High reliability

TruPlasma MF 7000 power supply—The highest level of plasma excitation

• Superior performance
• Broad power and frequency range
• Fast arc management system
• Modular design

Features：
• Broad power and frequency range
• Advanced arc management technology, extremely low arc residual energy
• Fast arc management reaction
• Flexible design structure
• High output current
• Leading power technology 

Customer benefit：
• Adjustable to various processes and applications
• Thin film deposition, and film uniformity 
• High deposition speed in extremely technical conditions.
• Convenient system integration
• Wide range of power regulation
• High reliability