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TruPlasma DC 3000 power supply series

• Compact structure and high reliability
• Advanced arc management techniques, leading to the residual energy of the arc reduction
• Low arc energy and fast recovery of the output
• Continuous processing improvement

Features：
• Broad power and frequency range
• Advanced arc management technology, extremely low arc residual energy
• Flexible arc management system
• Various user interface
• High reliability and long service life

Customer benefit：
• Applicable for kinds of techniques and usages
• Thin film deposition, and film uniformity
• Optimize the power parameters, to achieve high production and excellent performance
• Easily integrated into the system
• Maintenance cost reduction

New-type TruPlasma DC 3000 power supply series Water cooled DC power supply with compact structure. Due to the adoption of innovative CompensateLine arc management system, the series power supply can achieve the best coating quality, so it can replace the pulse power supply in magnetron sputtering process.

• The system greatly shortens the reaction time, and the residual arc energy reduced to a minimum rate
• Even in the high arc rate of the process, can ensure that the film in thin and homogeneous xondition

Features：
CompensateLine Technology enables the power supply to maintain performance in a high arc rate process
• Extremely low arc remnant energy, fast recovery
• Advanced DC sputtering applications
• To achieve high power output in a compact structure
• Full water cooled power supply scheme

Customer benefit：
• An expensive pulse AC power supply for a strong competitive program
• Significantly improve production efficiency
• High performance film quality
• Even greater than 40 kW power supply, and system integration also very convenient
• High system stability and low maintenance cost

TruPlasma DC 4000 power supply series

• Adjustable to the application of pulse DC power supply
• Arc management system with excellent performance
• Synchronous pulse mode

Features：
• Extremely low arc residual energy
• A short arc diagnosis time and rapid recovery of output
• Fast DSP control
• Synchronous pulse mode
• Broad tunable parameters: frequency and pulse data

Customer benifit：
• Ultra low substrate damage rate
• Greatly enhance the production efficiency
• To maintain a stable plasma and reduce the energy loss 
•  Process easy to optimize, and the user interface simple and easy to operate
• One equipment with multi-functions